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. 2014 Apr 1;20(15-16):2115–2126. doi: 10.1089/ten.tea.2013.0455

FIG. 1.

FIG. 1.

Fabrication and characterization of large-area, anisotropically-nanofabricated substrata (ANFS). (A) Schematic for UV-assisted capillary force lithography (CFL) used to fabricate nanopatterned substrata. Scanning electron microscope image with atomic force microscope image inset demonstrating the generation of nanogrooves using the method on (B) 11 MPa (NOA73) substrata and (C) 1.1 GPa (NOA83H) substrata. Substrata of both stiffnesses featured the same topographical dimensions of 800_800_600 nm (ridge width_groove width_ridge height). Scale bars: 5 μm. PUA, poly(urethane acrylate).