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Proposed workflow of the photoresistance switch. (I) Original state without laser illumination, (II) bubble growth at low power, (III) transition to bubble block, (IV) bubble retention at high power, and (V) bubble release that may contain the processes of bubble residues shrink at the interfaces and bubbles escape away from the pore entrance. The insets indicate each scenario as a red spot located in the hysteretic I–P curve.
