Table 1.

FIB milling rates, masking ability and the kind of electrical contact to the n-type ZnO [11] data for a selection of metals commonly used in microelectronics and MEMS technology.

	Ti	Al	Cr	Au	ZnO
FIB milling rate (Relative to Ti rate set to 100)	100	150	200	275	150
Masking ability	Best	Good	Good	Worst	–
Typical electrical contact with ZnO	Ohmic	Ohmic	Schottky	Schottky	–