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Etch and passivation parameters used in the fabrication of the microfluidic channels.
| Etch Cycle | Passivate Cycle | |
|---|---|---|
| SF6 Flow Rate | 100 sccm | 0 sccm |
| C4F8 Flow Rate | 0 sccm | 85 sccm |
| Duration | 12 s | 5 s |
| 13.56 MHz Platen Power | 800 W | 600 W |
| RF Coil Power | 600 W | 600 W |
