Table 5.
Ni(II) salt and reagents | conc. (mol L−1) | current density (mA cm−2) | deposition time min | temp. (°C) | substrate | product phase | comments | refs |
---|---|---|---|---|---|---|---|---|
Ni(NO3)2 | 0.1 | -2.5 | 10 | 22 | nickel sheet | α-Ni(OH)2 | product contains NO | [38] |
Ni(NO3)2 | 0.005 | -0.1 | 60 | 25 | stainless steel sheet (316L) | α-Ni(OH)2 | product contains NO | [13] |
produces nanoparticles (approx. 5 nm) | ||||||||
Ni(NO3)2 | 0.005 | -2.0 | 30 | 40 | stainless steel sheet (316L) | β-Ni(OH)2 | stacking fault disorder and very hydrated | [138] |
produces nanoparticles (approx. 100 nm) | ||||||||
NiCl2 | 0.1 | -2.5 | 10 | 22 | nickel sheet | α-Ni(OH)2 | product contains Cl− | [38] |
NiCl2 | 0.005 | -1.0 | —a | 10 | stainless steel sheet (316L) | β-Ni(OH)2 | stacking fault disorder and very hydrated | [139] |
produces nanoparticles (less than 5 nm) | ||||||||
NiSO4 | 0.1 | -2.5 | 2 | 22 | nickel sheet | α-Ni(OH)2 | very highly disordered material | [38] |
product contains SO | ||||||||
NiCl2 | 0.01 | -1.0 | 12.5 | 70 | graphite sheet | β-NixCo1−x(OH)2 | x=0.32 | [14] |
CoCl2 | 0.02 | product contains some α-phase material | ||||||
NaNO3 | 0.06 | |||||||
Ni(NO3)2 | 0.3 | -6.25 | 30 | 25 | nickel sheet | α-Ni(OH)2 | product is highly disordered | [35] |
KNO2 | 0.1 | unclear what the role KNO2 or KNO3 serve | ||||||
KNO3 | 0.1 | |||||||
NiCl2 | 0.01 | -1.0 | 12.5 | 70 | graphite sheet | α-Ni(OH)2 | NaNO3 is used to increase solution conductivity | [14] |
NaNO3 | 0.06 | |||||||
Ni(NO3)2 | 1.8 | −0.7 VbSCE | — | — | titanium sheet | α-Ni(OH)2 | Mix Brij 56 and aqueous solution, 50% (w/w) | [140] |
NaNO3 | 0.075 | remove surfactant template at 100°C for 1.5 h | ||||||
Brij 56 | pure | hexagonal pore array, dp=2.5 nm, dp−p=7.0 nm | ||||||
Ni(NO3)2 | 0.01 | −1.1 VbAg/AgCl | 1–100 s | 25 | boron-doped diamond | — | nanoparticle size determined by deposition time | [141] |
(1 s, d=12±3 nm; 15 s, d=39±9 nm) | ||||||||
longer times result in agglomerates |
a ‘—’ Indicates experimental details that were not provided.
bDeposition performed potentiostatically (at constant potential).