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. 2015 Jan 6;15(1):855–867. doi: 10.3390/s150100855

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© 2015 by the authors; licensee MDPI, Basel, Switzerland.

This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/4.0/).

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Figure 3. — Exposure to Al (800 nM) induces dramatic changes in intracellular H₂O₂ levels in growing Arabidopsis roots. Note that H₂O₂ levels are highest in the root tip, but that the elongation zone exhibits the strongest response to Al treatment. Furthermore, the differentiation zone, from where root hairs emerge, is also affected. The arrow indicates when the Al was added and the asterisks where the elongation zone is located. Images were acquired at 1-min intervals.