Figure 2.

Characterization of topographically patterned substrates. (A) Photograph image of nanotopography on polystyrene substrate and nanoscale pitch/depth pattern with pitch sizes from 400 to 4000 nm. (B) Scanning electron microscopic (SEM) images of flat and patterned substrates (400, 1400, and 4000 nm). Scale bars = 2 μm. (C) Atomic force microscope (AFM) analysis of the 400 nm pitch topographic features before and after collagen I coating demonstrating the preservation of features after coating.