Table 1.

Compilation of the results for the ONA reference material for different liquid metal ion gun and 2.5 keV Ar gas cluster ion beams measuring conditions

LMIG	Ar-GCIB		Sputter yield volume	Depth resolution
	Cluster size	Sputter time (s)		Averageb	SD
		(s)	(nm3)	(nm)	(nm)
Bi3+ 30 keV	620	2	21.96	9.93	0.41
	830	2	21.15	10.28	1.27
	1000	2	20.61	10.70	1.06
	1250	2	19.62	10.88	1.15
	1660	2	17.07	10.50	1.62
Bi5+ 30 keV	620	2	20.78	10.60	0.48
	830	2	21.63	10.33	0.30
	1000	2	20.88	10.33	0.48
	1250	2	20.87	10.78	0.29
	1660	2	20.07	9.95	0.37
Bi3+ 15 keV	620	2	21.77	9.93	0.54
	830	2	20.86	10.08	0.61
	1000	2	20.10	10.08	0.51
	1250	2	20.05	9.98	0.89
	1660	2	18.39	9.93	0.39
Bi3+ 15 keV	620	1	n.a.c	n.a.c	n.a.c
	830	1	21.99	9.75	0.75
	1000	1	20.48	10.08	0.91
	1250	1	20.33	10.03	1.02
	1660	1	18.35	9.83	0.96
Bi3+ 15 keV	620	int.a	19.84	10.33	1.00
	830	int.a	19.38	9.85	0.84
	1000	int.a	20.29	10.45	0.70
	1250	int.a	20.00	10.10	0.61
	1660	int.a	19.13	10.10	1.48

LMIG, liquid metal ion gun; GCIB, gas cluster ion beams.

^aInterlaced mode.

^bAverage of the four marker layer.

^cOmitted due to unstable operating conditions.