Table 1.

The structures of samples

	Before deposition	After deposition
PE-SA-1	80 nm a-Si:H/Si	30 nm Al2O3 (210 cycles) + 80 nm a-Si:H/Si
PE-SA-2	80 nm a-Si:H/Si	10 nm Al2O3 (85 cycles) + 80 nm a-Si:H/Si
T-SA-1	170 nm a-Si:H/Si	30 nm Al2O3 (200 cycles) + 170 nm a-Si:H/Si

The numbers of ALD deposition cycles are shown behind the Al₂O₃ film thickness.