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. 2015 Apr 24;5:9932. doi: 10.1038/srep09932

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(a) TEM image of Si–N nanocrystals with various shapes in amorphous film after irradiation of electron beam for 30min, in which the film structure is still kept. (b) TEM image of Si–O nanocrystals with various shapes in amorphous film after irradiation of electron beam for 30min, in which the film structure has been broken because of stronger condensed ability of O atoms. (c) TEM image of Si–S nanocrystals with various shapes in amorphous film after irradiation of electron beam for 30min, in which the film structure has been broken because of stronger condensed ability of S atoms.