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. 2014 Mar 15;21(Pt 3):600–612. doi: 10.1107/S1600577514003439

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© Yuki Sekiguchi et al. 2014

This is an open-access article distributed under the terms of the Creative Commons Attribution Licence, which permits unrestricted use, distribution, and reproduction in any medium, provided the original authors and source are cited.

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Results from the data processing by the TAMON subprogram. (a) Diffraction patterns before (left) and after (right) background correction in the readout port, in which some pixels received X-ray photons exceeding the saturation limit. (b) Line profiles before (red circles) and after (green crosses) the correction between points A and B of the diffraction patterns in (a). (c) Histogram of the diffraction intensities of a user-defined ROI for 8738 diffraction patterns from cuboid-shaped copper oxide samples. Blue, pink and green histogram bars indicate no signal (820 diffraction patterns), below (3389) and above (4529) the given threshold intensity value, respectively.