Skip to main content
. 2015 Jun 9;3:e864. doi: 10.7717/peerj.864

Table 1. Materials used in this study.

Material type/ Commercial name Type Matrix type Photoinitiator system Filler type Filler loading (vol%) Shade Manufacturer Batch #
Mycro-hybrid SureFil® SDR™ Flow (SDR) F, L Polymerization modulator, dimethacrylate resins, UDMA CQ Ba-B-F-Al silicate glass, SiO2, Sr–Al silicate glass, TiO2 44 U Dentsply 91130
Mycro-hybrid Tetric N Flow (TNF) F Bis-GMA, Bis-EMA, UDMA, TEGDMA CQ Barium glass, ytterbium trifluoride, Ba-Al-fluorosilicate glass, SiO2 39 A2 Ivoclar /Vivadent L40758
Nanofilled Filtek Z350 Flow (FZ350F) F Bis-GMA, Bis-EMA, TEGDMA CQ Agregated zirconia/silica cluster 55 A2 3M Espe 1027100529
Mycro-hybrid Esthet-X HD (EXHD) C Bis-GMA, Bis-EMA, TEGDMA CQ Barium fluoroborosilicate glass and silica 60 A2 Dentsply L58656
Mycro-hybrid Tetric N Ceram (TNC) C Bis-GMA, Bis-EMA, UDMA CQ Barium glass, ytterbium trifluoride, Ba-Al-fluorosilicate glass, SiO2 55–57 A2 Ivoclar /Vivadent 026700190
Nanofilled Filtek Z350 XT (FZ350) C Bis-GMA, Bis-EMA, UDMA, TEGDMA CQ Agregated zirconia/silica cluster 63.3 A2 E 3M Espe 1026600561
Mycro-hybrid Filtek P90 (FP90) C, L 3,4-Epoxycyclohexyl ethylcyclopolymethylsiloxane, CQ, iodonium salt and electron donor Silanized quartz; yttriumfluoride 55 A2 3M Espe 3480370

Notes.

F
flowable
C
conventional
L
low-contraction
Bis-GMA
bisphenol-glycidyl-methacrylate
Bis-EMA
bisphenol-a-ethoxydimethacrylate
UDMA
urethane-dimethacrylate
TEGDMA
triethyleneglycoldimethacrylate
HEMA
hydroxyethylmethacrylate
CQ
camphorquinone