TABLE III.

Indium Air Concentrations for Two Copper Indium Gallium Diselenide (CIGS) and One Amorphous Silicon (a-Si) Photovoltaic Companies

Type	Job/Task or Area	Reported Controls	Data Source	Year	Indium Source	Dur. (min)	Air Vol. (L)	Mass (μg)	Air Conc. (mg/m3)	RL (μg)
	COMPANY 3 (CIGS)
P	Clean sputter chamber, grinding	LEV hood for parts cleaning	NIOSH	2010	ITO	122	374.4	260	0.69	0.3
P	Clean sputter chamber, grinding	HEPA vacuum	NIOSH	2010	ITO	291	859.6	62	0.072	0.3
	COMPANY 4 (CIGS)
P	Operate roll coater		Comp.	2008	CIG	420	858	NP	< 0.012	NP
P	Operate roll coater		Comp.	2008	CIG	384	753	NP	< 0.013	NP
P	Clean chamber, scraping, Scotch-Brite pads		Comp.	2008	CIG	430	867	NP	< 0.012	NP
P	Clean chamber, scraping, Scotch-Brite pads		Comp.	2008	CIG	435	948	NP	< 0.011	NP
A	Near chamber		Comp.	2008	CIG	455	946	NP	< 0.013A	NP
A	Computer work station		Comp.	2008	CIG	472	927	NP	< 0.021	NP
P	Clean chamber, scraping, chiseling	Tent enclosure, HEPA vacuum	Comp.	2010	CIG	270	447	22	0.049	0.06
P	Clean chamber, scraping, chiseling	Tent enclosure, HEPA vacuum	Comp.	2010	CIG	270	432	26	0.061	0.06
A	Inside chamber tent enclosure during cleaning		Comp.	2010	CIG	380	652	3.9	0.006	0.06
A	Perimeter walkway		Comp.	2010	CIG	375	619	0.16	0.00026	0.06
A	Entrance to tent enclosure		Comp.	2010	CIG	315	538	0.12	0.00022	0.06
A	Behind chamber		Comp.	2010	CIG	375	608	0.073	0.00012	0.06
A	Near slitter and conveyor		Comp.	2010	CIG	487	931	0.74	0.0008	0.06
A	Between conveyors		Comp.	2010	CIG	487	980	0.43	0.0004	0.06
A	Below slitter tool		Comp.	2010	CIG	487	969	0.62	0.0006	0.06
A	Workstation		Comp.	2010	CIG	466	936	0.28	0.0003	0.06
	COMPANY 5 (a-Si)
P	Clean sputter chamber, hand sanded target with abrasive screen, hand scraper on shields	Non-HEPA vacuum	Comp.	2011	ITO	31	62.3	9.8	0.16	0.1
P	“Sandblast” 3 shields	Canopy hood, dust collection system vented into blasting room	Comp.	2011	ITO	231	464.5	110	0.24	0.1
P	Clean sputter chamber, hand scraper on inside surfaces, wire brush to clean target	Non-HEPA vacuum	Comp.	2011	ITO	23	47.3	15	0.32	0.1
P	Clean evaporation chamber, hand scraper on inside surfaces and on a screen	Non-HEPA vacuum	Comp.	2011	ITO	97	178	970	5.4	0.1
P	Clean same evaporation chamber as above	Hand scraper attached to HEPA vacuum	Comp.	2011	ITO	53	108.8	31	0.28	0.1

^AComputational error in company data corrected.

A = area sample; a-Si = amorphous silicon; CIG = copper indium gallium; Comp. = Company; Conc. = concentration; Dur. = duration; ITO = indium tin oxide; LEV = local exhaust ventilation; NP = information not provided; P = personal sample; RL = reporting Limit; Vol. = volume.