TABLE V.
Indium Air Concentrations in Miscellaneous Industries
| Type | Job/Task or Area | Data Source | Year | Indium Source | Dur. (min) | Air Vol. (L) | Mass (μg) | Air Conc. (mg/m3) | RL (μg) |
|---|---|---|---|---|---|---|---|---|---|
| Sputter Target Bonding Services | |||||||||
| COMPANY 7 | |||||||||
| P | Technician | Comp. | 2009 | In metal (solder) | 540 | NP | NP | 0.016 | NP |
| COMPANY 8 | |||||||||
| P | Technician | NIOSH | 2010 | In metal (solder) | 416 | 1265 | 9.5 | 0.0075 | 0.6 |
| P | Technician | NIOSH | 2010 | In metal (solder) | 467 | 1387 | 13 | 0.0094 | 0.6 |
| Compound Semiconductor Manufacturing | |||||||||
| COMPANY 9 | |||||||||
| P | Technician, thinning and polishing | NIOSH | 2011 | InP | 471 | 1439 | < 0.3 | < 0.0002 | 0.3 |
| A | At back grinder, LEV, enclosure | NIOSH | 2011 | InP | 464 | 1410 | 0.45 | 0.0003 | 0.3 |
| A | At polisher (in laboratory hood) | NIOSH | 2011 | InP | 467 | 1422 | < 0.3 | < 0.0002 | 0.3 |
| Alkaline Battery Manufacturing | |||||||||
| COMPANY 10 | |||||||||
| P | Process Operator | Comp. | 2011 | Proprietary | 300 | 753.4 | < 1.8 | < 0.0024 | 1.8 |
| P | Process Operator | Comp. | 2011 | Proprietary | 17 | 42.59 | < 1.8 | < 0.042 | 1.8 |
| P | Process Operator | Comp. | 2011 | Proprietary | 300 | 756 | < 1.8 | < 0.0024 | 1.8 |
| A | Production Area | Comp. | 2011 | Proprietary | 180 | 448.7 | < 1.8 | < 0.0040 | 1.8 |
| A | Production Area | Comp. | 2011 | Proprietary | 180 | 450.5 | < 1.8 | < 0.0040 | 1.8 |
| A | Production Area | Comp. | 2011 | Proprietary | 180 | 451.6 | < 1.8 | < 0.0040 | 1.8 |
A = area sample; Comp. = Company; Conc. = concentration; Dur. = duration; LEV = local exhaust ventilation; NP = information not provided; P = personal sample; RL = reporting limit; Vol. = volume.