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. 2015 May 6;15(5):10686–10704. doi: 10.3390/s150510686

Figure 1.

Figure 1

SEM images of SnO2 films deposited onto ITO substrate at −1.0 V (vs. Ag/AgCl) with charge density (Q) of (a) 0.2; (b) 0.4 and (c) 0.8 C·cm−2; (d) Typical cross-section HRTEM image of the film deposited with Q of 0.8 C·cm−2. Inset shows the corresponding SAED pattern.