Table 4.

Vapour phase and liquid phase silanization: resistance value R₁ obtained from fitting experimental data to the equivalent circuit for 220-nm-thick-nanoporous-SnO₂ electrodes after silanization, after DNA probe immobilization and after complementary DNA hybridization with different target concentrations.

Vapour Phase Silanization
CDNA target (μM)	R1 (Ω)				∆R1/R1 (%)
	SnO2 Film	Silanized	ss_DNA	ds_DNA
2.0	96,782	43,2768	167,202	61,836	−63 ± 5
1.0	86,453	370,742	147,929	76,689	−48 ± 5
0.5	85,310	377,590	143,687	97,006	−33 ± 3
0.1	81,101	416,567	121,467	99,531	−18 ± 3
0.01	79,987	393,879	126,847	111,929	−11 ± 3
Liquid Phase Silanization
CDNA target (μM)	R1 (Ω)				∆R1/R1 (%)
	SnO2 Film	Silanized	ss_DNA	ds_DNA
1.0	97,419	144,626	47,492	34,015	−28 ± 5
0.5	97,926	151,935	45,305	37,707	−17 ± 3
0.1	95,509	135,238	43,923	40,441	−7 ± 2
0.01	95,264	141,849	48,337	47,538	−2 ± 1