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. 2015 Jun 25;6:7430. doi: 10.1038/ncomms8430

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(a) AFM image of a triangular MoS₂ monolayer. Inset shows the histogram analyses of multiple topographic AFM images confirmed the MoS₂ film thickness to be ∼0.75 nm. (b) High-resolution TEM image of the synthesized MoS₂ monolayer. Inset is the corresponding diffraction pattern. (c) A typical AFM image of a MoS₂ monolayer device. (d) Schematic illustration of a MoS₂ device under mechanical load applied by an AFM tip.