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. 2015 Jun 25;6:7564. doi: 10.1038/ncomms8564

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(a) Persistence length λ_MSED calculated via the MSED method versus the processing length. (b) Adjusted coefficient of determination (goodness of fit) and fitting error versus the processing length. (c) Length distribution of W-CNF rigid segments. The red vertical lines in a–c correspond to the processing length 170 nm at which the fitting error is minimal. (d) MSED versus internal contour length fit at the distance with the minimal fitting error. The resulting persistence length is λ_MSED=2.84 μm.

Inline graphic — (a) Persistence length λ_MSED calculated via the MSED method versus the processing length. (b) Adjusted coefficient of determination (goodness of fit) and fitting error versus the processing length. (c) Length distribution of W-CNF rigid segments. The red vertical lines in a–c correspond to the processing length 170 nm at which the fitting error is minimal. (d) MSED versus internal contour length fit at the distance with the minimal fitting error. The resulting persistence length is λ_MSED=2.84 μm.