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. 2014 Dec 23;9:692. doi: 10.1186/1556-276X-9-692

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© Panja et al.; licensee Springer. 2014

This article is published under license to BioMed Central Ltd. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.

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Statistical distribution of HRS and LRS. The thicknesses of Al₂O₃ film are (a) 2 nm and (b) 10 nm. The LRS decreases with increasing the CCs of 100 to 1,000 μA for the 0.4-μm devices. The 2-nm-thick Al₂O₃ film shows superior resistance ratio than that of the 10-nm-thick films.