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. Author manuscript; available in PMC: 2016 Sep 7.
Published in final edited form as: Phys Chem Chem Phys. 2015 Sep 7;17(33):21211–21219. doi: 10.1039/c4cp05291a

Figure 1. Protocol for nanosphere lithography.

Figure 1

(a) Substrate (quartz slides) cleaning in an acid piranha bath at 90 °C for 2 h and sonication in acetone, methanol, and deionized water; (b) deposition of a monolayer of polystyrene spheres on the cleaned substrates; (c) polystyrene sphere etching using an oxygen plasma asher; (d) 5 nm thick titanium adhesion layer deposition; (e) 45 nm thick Au layer deposition; (f) polystyrene sphere removal by sonication in methanol; (g) nanohole or nanotriangle arrays formed depending on time of sphere-etching.