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. Author manuscript; available in PMC: 2016 Aug 1.
Published in final edited form as: Dev Dyn. 2015 Aug;244(8):921–934. doi: 10.1002/dvdy.24283

Figure 2. Persistent activation of hypothalamic Notch affects expression of patterning factors within the hypothalamus and Rathke’s pouch.

Figure 2

Hematoxylin and eosin (H&E) staining in sagittal sections at e10.5 shows the morphology of control (A) and NICD Tg (B) hypothalamic (Hyp) and pituitary regions, displaying loss of the infundibulum (INF) and thin RP in NICD Tg mice. Expression of Shh mRNA, detected by in-situ hybridization, is restricted to the anterior hypothalamus in control mice (C), while boundaries of Shh expression are disrupted in NICD Tg mice (D). Additionally, persistent expression of Notch1 results in loss of OTX2 expression within the INF (F) compared to controls (E). Another important hypothalamic patterning gene, Fgf10, is normally expressed throughout the INF in control mice (G), and has reduced expression in NICD Tg animals (H). Immunohistochemistry shows that expression of p-ERK, which is uniformly expressed in RP of control animals (I), is lost on the caudal side of RP in Tg animals (brackets, J). Scale bar, 50μm.