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External source system dynamics and the influence of hindered substrate diffusion. Total A concentration in each compartment for external source oscillatory system (originating in ΩL) given (a) fast (DA = 2.6 μm2/ms) and (c) slow (DA = 0.11 μm2/ms) diffusion coefficients. Corresponding spatiotemporal plots for fast and slow diffusion coefficients are given in (b) and (d), respectively.
