Table 1.
Deposition parameter | 60 A 0 V | 90 A 50 V |
---|---|---|
Target | Ti | |
Working pressure (Pa) | 0.5 | |
Deposition time (min) | 20 | |
Target voltage (V) | 20 | |
Target current (A) | 60 | 90 |
Substrate bias (−V) | 0 | 50 |
Crystal structure of TiO2 coating | A-TiO2 | R-TiO2 |
Deposition parameter | 60 A 0 V | 90 A 50 V |
---|---|---|
Target | Ti | |
Working pressure (Pa) | 0.5 | |
Deposition time (min) | 20 | |
Target voltage (V) | 20 | |
Target current (A) | 60 | 90 |
Substrate bias (−V) | 0 | 50 |
Crystal structure of TiO2 coating | A-TiO2 | R-TiO2 |