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. 2015 Nov 17;15:910. doi: 10.1186/s12885-015-1790-z

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© Crochiere et al. 2015

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The Creative Commons Public Domain Dedication waiver (http://creativecommons.org/publicdomain/zero/1.0/) applies to the data made available in this article, unless otherwise stated.

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Fig. 1 — Generation of SINE compound-resistant HT1080 cells. a HT1080 parental cells grown in 0, 3.7, 12.3, 111, 333, and 1000 nM KPT-185 in an 8 day clonal assay (stained with gentian violet) for the selection of the KPT concentration to initiate generation of the resistant cell line. b IC₅₀ values for parental and resistant cells treated with KPT-185, KPT-330, and LMB, determined in an MTT assay. c HT1080 parental and resistant cells grown in 1 μM KPT-185 in the 8 day clonal growth assay (stained with gentian violet). d FACS cell-cycle analysis of HT1080 parental and resistant cells treated with 0 or 600 nM KPT-185 for 1–3 days