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. 2015 Dec;124:77–82. doi: 10.1016/j.antiviral.2015.10.006

Fig. 1.

Fig. 1

Generation of resistant isolates. WT EV71 was passaged in the presence of either (A) 0.1 nM NLD, (B) 0.9 nM GPP3, (C) 80 nM ALD or, (D) a combination of 0.1 nM NLD and 0.9 nM GPP3, (E) WT CVA16 was passaged in the presence of 20 nM GPP3. Each isolate was passaged a total of 8 times and after each passage a sample was titrated in the presence of the selecting concentration of compound. CVA16 isolates resistant to NLD or ALD were not selected.