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. 2016 Jan 5;6:18886. doi: 10.1038/srep18886

Figure 6.

Figure 6

(a) Sketch map for the formation of the inclined planes at the pattern edge of the sculptured nanoarrays; (b) SEM image of nanoarrays@ photoresist after development treatment. The dashed line indicates the inclined profile of the photoresist edge.