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. 2015 Dec 4;15(12):30311–30318. doi: 10.3390/s151229809

Figure 2.

Figure 2

(a) Cross section SEM view of the tri-layer PMMA after electron beam lithography (EBL) exposure and development; (b) SEM top view of the full device and (c,d) detailed view of the largest and smallest gaps and sensor to pole distances fabricated using this strategy.