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. 2016 Jan 27;6:19945. doi: 10.1038/srep19945

Figure 2.

Figure 2

(a) The optical image of a representative etched sample consisting of flakes with the different number of layers including 1, 2, 3, 8, 19, 22, and 71 layers. SM denotes the MoS2 residues due to imcomplete removal of monolayer. (b) AFM image of the area squared in (a). (c) AFM depth profiles showing 1, 2 and 3 layers of MoS2 as marked by blue lines in (b). (d) The optical image of the same sample after another 7 min fine etching showing that 7 MoS2 layers have been removed uniformly from all domains starting with more than 7 layers.