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. 2016 Jan 29;6:19719. doi: 10.1038/srep19719

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Copyright © 2016, Macmillan Publishers Limited

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The schematics of four different samples are shown in (a). F1: ion irradiation accompanied by simultaneous gas exposure (167 s). F2: first ion irradiation and ion irradiation again accompanied by gas exposure (167 s). F3: first ion irradiation and then only gas exposure (167 s). F4: only gas exposure (167 s) as a control experiment. In the schematics, each ion irradiation refers to 10¹³ ions/cm². (b) XPS of F 1 s intensity comparison of different samples. Comparing the fluorine intensity of F1-F4, these relations are found: I_F2 > I_F1, I_F3 > I_F4 and I_F1 ≈ 6I_F4. F4 is the controlled experiment to study the influence of XeF₂ exposure without irradiation.