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. 2016 Jan 22;7:10518. doi: 10.1038/ncomms10518

Figure 2. SEM images of orthogonal self-assembly of BCP on top of BCP or HSQ patterns.

Figure 2

(a) Mesh-shaped structure in an interference-lithography trench template. The SD45 BCP cylinders (bottom layer) are oriented in the y-direction along the trenches and SD16 BCP cylinders (top layer) were orthogonally self-assembled along the x direction (see Supplementary Fig. 1 for larger image and GISAXS results). (b) Nanomesh with graded thickness of top-layer BCP (see Supplementary Fig. 3 for larger image). (c,d) Orthogonal self-assembly of SD16 BCP over HSQ line arrays with 100 and 200 nm periods (see Supplementary Fig. 4 for other periods). (e) Ultra-high-density nanomesh patterns of low-molecular-weight BCP bilayers (see Supplementary Fig. 5 for larger image). (f) Orthogonal self-assembly of SD16 BCP over concentric EBL-patterned circles (see Supplementary Fig. 6 for full-size image and different period of templating circles). Scale bars, 100 nm.