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. Author manuscript; available in PMC: 2016 Sep 22.
Published in final edited form as: ACS Nano. 2015 Aug 26;9(9):9087–9096. doi: 10.1021/acsnano.5b03231

Figure 4.

Figure 4

(a) Variation of average counts/min for T = 3 and T = 4 capsids with initial Cp149 dimer concentration in resistive-pulse sensing measurements after a 60-min assembly reaction in 1 M NaCl. The pseudo-critical dimer concentration is 0.5 µM. (b) Variation of the fraction of T = 3 and T = 4 capsids with initial Cp149 dimer concentration in 1 M NaCl. Data in panels (a) and (b) are taken from 54 assembly reactions made on 5 devices and are based on more than 700,000 particles. Error bars are ±σ.