Table 1. Analyses of chemical composition of the surface layer calculated from the XPS spectra.
| Cp-Ti-AO | Cp-Ti-HW | p | TNS-AO | TNS-HW | p | |
|---|---|---|---|---|---|---|
| O 1s Metal Ox | 52.0 (0.56) | 49.6 (3.08) | 54.7 (1.99) | 57.1 (1.52) | ||
| O 1s OH- | 16.1 (0.66) | 17.0 (3.12) | 0.59 | 14.0 (2.43) | 11.5 (2.16) | 0.07 |
| O 1s H2O | 1.4 (0.22) | 2.5 (0.69) | 0.015* | 0.4 (0.29) | 1.0 (0.25) | 0.019* |
| Ti 2p | 30.0 (0.1) | 29.0 (0.9) | 27.7 (0.95) | 21.6 (0.47) | ||
| N 1s | 0.4 (0.04) | 1.9 (1.42) | 0.3 (0.27) | 0.5 (0.25) | ||
| Nb 3d | 2.5 (0.39) | 7.5 (0.1) | ||||
| Sn 3d | 0.3 (0.09) | 0.9 (0.07) |
The calculated chemical composition derived from XPS spectra for the surfaces of the anodic oxides before and after HW treatment. The data are averages of the measurements of six samples taken for each group, with standard deviations given in parentheses.
(*: p < 0.05).