Figure 13.

(a,b) POM images of the in‐plane photoalignment patterned film under crossed polarizers that were rotated from each other (scale bar 100 μm). After annealing at 125 °C for 10 min, the film was irradiated with LPL at 600 mJ cm⁻² over the whole area, and subsequently patterned using irradiation with LPL rotated 45° through a photomask. (c,d) POM images of the in‐plane and out‐of‐plane patterned film by inkjet printing under crossed polarizers 45° from one another (scale bar 200 μm). Note that the positive and negative patterns of the images were fully switched. Adapted with permission from reference [31]. Copyright 2014, Nature Publishing Group.