Table 2.
Nanochannels/nanoslits fabricated in various polymeric materials along with the characteristic geometry of the structures and their reported application
Material | Dimension (nm, width × depth) | Fabrication method | Application | Reference |
---|---|---|---|---|
PDMS | 690 × 80 | Crack-induced tunable | λDNA stretching | Huh et al. (2007)165 |
PDMS | 7 × 103 nm2 (area) | Tunnel cracking | Nanoparticle trapping | Mills et al. (2010)166 |
PDMS | 1470 × 275 | Wrinkle induced by oxygen plasma | Protein preconcentration | Seok et al. (2008)257 |
PDMS | 100, 500 (depth) | Deformation of thin PDMS | DNA stretching | Park et al. (2009)171 |
PDMS | 200 × 60 | Collapse of micron-scale PDMS microchannels. Glass/PDMS bonding substrate | DNA elongation and surface enhanced Raman detection of nucleic acids | Park et al. (2009)172 |
PDMS | 400 × 20 | Nanochannels cracked from PS petri-dish induced by ethanol | Ion selective enrichment | Xu et al. (2010)37 |
PMMA | 200 × 2000 | Proton beam writing, thermal fusion bonding | NA | Shao et al. (2006)188 |
SU-8, SiO2 layer | 250 × 250 | EBL and NIL, thermal fusion bonding | DNA stretching | Thamdrup et al. (2008)159 |
PMMA, COC, PC | 3000/7000 × 100 | Nanomolding replication, NIL, oxygen plasma treatment with thermal fusion bonding | λDNA transport dynamics and DNA mobilities | Chantiwas et al. (2010)59 |
PMMA | 300 × 500, 300 × 140 and 75 × 120 | Imprinting nanostructure from Si etched into PMMA thin film | DNA stretching | Guo (2004)134 |
PMMA | 10 000 × 80 | Si molding with thermal fusion bonding | NA | Abgrall et al. (2007)191 |
PC | 100-900 wide, 200 nm wire | Hot embossing of silica nanowire molding with PC substrate, PDMS for cover plate bonded material | NA | Zhang et al. (2008)194 |
PMMA | 185 × 85 | Replication of polymer stamp and polymer nanofluidic channels by NIL using polymer stamp | NA | Wu et al. (2010)196 |
PI (Polyimide) | 2000-30 000 wide, 100 and 500 nm deep | Spin coat PI onto Si wafer and deposition of Al as sacrificial layer; etch Al, deposit another layer of PI and remove patterned Al | EOF measurements | Eijkel et al. (2004)203 |