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Tested resist performance criteria
| Performance criteria | AMO NIL MMS4 | DELO-KATIOBOND OM VE 110707 |
|---|---|---|
| Imprint pressure (kPa) | 475 | 376 |
| Curing dose (J/cm2) | 8.0 | 0.4 |
| Etched by O2 plasma | No | Yes |
| Si:resist etch ratio | 1:1 | 4.87:1 |
| Maximum iterations/soft-PDMS stamp | 14 | 34 |
| Radiation bleed (μm) | 300 | 70 |
