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. 2016 Mar 9;11:131. doi: 10.1186/s11671-016-1342-8

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© Li et al. 2016

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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Fig. 1 — Fabrication procedure of ITO nanowires. a PS assembly on p-GaN or quartz wafer. b PS size reduced by oxygen plasma etching. c ITO NWs deposited on samples. d PS lift-off and ITO NWs film fabricated