Table 1. BM23 beamline: main characteristics.
Beamline name | BM23 | |
Source | 0.85 T ESRF bending magnet | |
Primary slits | 10 mm × 0.3 mm located at 23.5 m | |
Monochromator | Fixed-exit double-crystal monochromator (DCM) Si(111/311/511) | |
Mirrors | Double mirrors 2–5 mrad Si/Pt/Rh stripes | |
Energy range | 5−75 keV | |
Beam size (unfocused) | 15 mm by 1 mm | |
Flux on sample (unfocused) | 1.2 × 1011 photons s−1 at 21 keV in 0.35 mrad × 14 µrad at 200 mA using a Si(111) DCM and RH mirrors at 2 mrad† | |
Beam size (focused) | 4 µm × 4 µm (FWHM) using a pair of Pt-coated mirrors in KB geometry | |
Flux (focused) | 4 × 109 photons s−1 at 21 keV in 0.02 mrad × 10 µrad at 200 mA using a Si(111) DCM and KB mirrors at 3 mrad† | |
Detectors | Ionization chambers, diodes, 13-element Ge detectors, Si drift diodes, MAR 165 CCD | |
Sample environments | Automatic sample changer, low-temperature (1.6–400 K), high-temperature (300–3000 K), high-pressure (1–100 GPa), high-temperature reactors, plug flow capillary microreactors |
Measured with a calibrated Si PIN diode.