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. 2015 Oct 17;22(Pt 6):1548–1554. doi: 10.1107/S1600577515017786

Table 1. BM23 beamline: main characteristics.

Beamline name BM23
Source 0.85 T ESRF bending magnet
Primary slits 10 mm × 0.3 mm located at 23.5 m
Monochromator Fixed-exit double-crystal monochromator (DCM) Si(111/311/511)
Mirrors Double mirrors 2–5 mrad Si/Pt/Rh stripes
Energy range 5−75 keV
Beam size (unfocused) 15 mm by 1 mm
Flux on sample (unfocused) 1.2 × 1011 photons s−1 at 21 keV in 0.35 mrad × 14 µrad at 200 mA using a Si(111) DCM and RH mirrors at 2 mrad
Beam size (focused) 4 µm × 4 µm (FWHM) using a pair of Pt-coated mirrors in KB geometry
Flux (focused) 4 × 109 photons s−1 at 21 keV in 0.02 mrad × 10 µrad at 200 mA using a Si(111) DCM and KB mirrors at 3 mrad
Detectors Ionization chambers, diodes, 13-element Ge detectors, Si drift diodes, MAR 165 CCD
Sample environments Automatic sample changer, low-temperature (1.6–400 K), high-temperature (300–3000 K), high-pressure (1–100 GPa), high-temperature reactors, plug flow capillary microreactors

Measured with a calibrated Si PIN diode.