Table 4.
Well | Area | E SEM (% ± std) |
---|---|---|
6 | 1 | 55 ± 3 |
2 | 27 ± 3 | |
3 | 43 ± 1 | |
4 | 48 ± 2 | |
5 | 11 ± 3 | |
18 | – | 17 ± 4 |
24 | – | 52 ± 8 |
Average | 36 ± 17 |
Well 6, divided and analyzed in five areas, three images in each area, shows some variability in efficiency over the wafer surface. Wells 18 and 24 show a deposition efficiency in the same range as well 6