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Proposed polymethacrylate-based matrix network structure and the intrinsic self-repair processes: (A) polymethacrylate-based network formed by free radical initiated polymerization and limited photoacid-induced sol-gel reaction in dry condition after 40 s irradiation; (B) photoacid-induced sol-gel reaction of sample stored in dry condition for 48 h; (C) self-repair via sol-gel reaction in wet environment; (A’), (B’), and (C) show the magnify of part of the network structure.
