Table 1.
Changes in resistance between Au electrodes treated with various concentrations of HAuCl4 after RCA
| HAuCl4 concentration (μM) | Resistance (GΩ) | |
|---|---|---|
| With target DNA | 0.5 | 125 |
| 5 | 20 | |
| 50 | 5 | |
| Without target DNA | 50 | 143 |
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