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Fabrication process of Si–SLG Schottky PDs integrated with photonic waveguides. (a) Planar SOI substrate; (b) PECVD deposition and patterning of SiN mask; (c) local oxidation; (d) etching of SiN and SiO2 Al ohmic contact to Si; (e) SLG transfer; (f) formation of Schottky contact and consequent SLG etching.
