. 2016 Jun 16;6:28190. doi: 10.1038/srep28190

Table 2. The optimized values of gold thin film, silicon nanosheet thickness and the number of MX₂ layers with corresponding excitation wavelength, change in resonance angle, sensitivity and FWHM of the SPR curve for each silicon-MX₂ nanosheet enhanced model.

Excitation wavelength (nm)	Type of TMDC	Gold thickness (nm)	Silicon thickness (nm)	Number of WS₂ layers (L)	Minimum Reflectivity	Δθ_SPR (Deg) (Δn_bio = 0.005)	Sensitivity (Deg/RIU)	FWHM (Deg)
600	WS₂	35	7	1	2.5592 × 10⁻²	0.7784	155.68	17.4644
633	MoS₂	40	7	1	1.1513 × 10⁻⁵	0.6586	131.70	17.5728
633	WSe₂	40	7	2	5.3807 × 10⁻³	0.7070	141.40	17.2340
633	MoSe₂	40	7	1	2.0438 × 10⁻³	0.6584	131.68	17.0915

Table 2. The optimized values of gold thin film, silicon nanosheet thickness and the number of MX2 layers with corresponding excitation wavelength, change in resonance angle, sensitivity and FWHM of the SPR curve for each silicon-MX2 nanosheet enhanced model.