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(a) SEM images of SiC resistors released from the Si substrate using a MEMS photolithography process; (b) The IV curve of a SiC resistor measured at low applied voltage to avoid the effect of Joule heating; (c) Measurement of the current leakage through the SiC/Si junction when the SiC/Si strip was uniformly heated at high temperatures up to 200 °C.
