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. 2016 Jun 28;17:94. doi: 10.1186/s12863-016-0399-9

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© The Author(s). 2016

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The Creative Commons Public Domain Dedication waiver (http://creativecommons.org/publicdomain/zero/1.0/) applies to the data made available in this article, unless otherwise stated.

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Fig. 2 — Genetic effects and phenotypic variation explained (PVE) by genetic components for traits related to flag leaf morphology of main shoots in wheat RIL population across four environments. A, AA, AE and AAE mean additive effect, epistatic effect, additive QTL × environment interaction effect and epistatic QTL × environment interaction effect, respectively; h ²(A), h ²(AA), h ²(AE) and h ²(AAE) represent phenotypic variation explained (PVE) by A, AA, AE and AAE, respectively. Different lowercase letters indicate significant differences (P < 0.05) between genetic components for each trait