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. 2016 Jun 17;16(6):904. doi: 10.3390/s16060904

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© 2016 by the authors; licensee MDPI, Basel, Switzerland.

This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC-BY) license (http://creativecommons.org/licenses/by/4.0/).

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Comparison of TEM images of a [Py_3nm/Cu_6nm/Co_3nm/Cu_6nm]₂₀ multilayer in the as prepared state (a) and after annealing at 450 °C for 24 h (b). The insets show the corresponding selected area diffraction pattern. The micrographs prove that the layered structure of the sample is preserved during annealing while the microstructure changes from polycrystalline to quasi single crystalline, oriented in fcc [100] direction; (c) X-ray diffraction pattern of a Co/Cu multilayer system before and after annealing showing the recrystallization effect; (d) GMR measurements at room temperature for the recrystallized Co/Cu multilayer: the GMR effect remains stable at further heat treatment at 400 °C for 64 h [33].

Comparison of TEM images of a [Py_3nm/Cu_6nm/Co_3nm/Cu_6nm]₂₀ multilayer in the as prepared state (a) and after annealing at 450 °C for 24 h (b). The insets show the corresponding selected area diffraction pattern. The micrographs prove that the layered structure of the sample is preserved during annealing while the microstructure changes from polycrystalline to quasi single crystalline, oriented in fcc [100] direction; (c) X-ray diffraction pattern of a Co/Cu multilayer system before and after annealing showing the recrystallization effect; (d) GMR measurements at room temperature for the recrystallized Co/Cu multilayer: the GMR effect remains stable at further heat treatment at 400 °C for 64 h [33].