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. 2016 Jul 22;6:30113. doi: 10.1038/srep30113

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(a) XPS etching by way of a beam of 5 kV Ar-ion for: (a) sequentially sputtered FeOx/TiO₂-PE film (1) Ti2p, (2) Fe2p and (3) O1s and (b) co-sputtered FeOx-TiO₂-PE film showing the atomic percentage concentration of atoms (1) Ti2p, (2) Fe2p and (3) O1s in the topmost layers (2 nm) as a function of penetration depth.