Figure 2. Temperature profiling during NIR exposure.

(A) Schematic of 808 nm NIR laser module: NIR source is fixed to a holder and connected to an external power supply. Beneath the NIR source is a heated stage insert to keep the cell-culture system at original culture of 37 °C. Temperature of cell culture system exposed to NIR with or without MNPs is measured with the help of a thermocouple wire. (B) Temperature profile of different experimental group: Cell culture with or without MNPs were exposed with ~1.5 Wcm⁻² NIR for 2 minutes and temperature were recorded via placing thermocouple at the bottom of well throughout the exposure period. Effect of NIR or MNPs-NIR on temperature of cell culture ambience of individual well was obtained by temperature difference at the beginning (0 second) and end (120 seconds) of exposure. NIR exposure on cell culture system without MNPs showed a temperature rise of 0.46 ± 0.152 °C and that of with MNPs showed an increase of 0.83 ± 0.057 °C (*P < 0.0177).