Table 1. Ink formulations used in deposition of patterned constructs.

Ink	Agarose concentration (w/v%)	SWCNT concentration (w/v%)	NIH 3T3 cell concentration (cells mL−1)
A1	1	0	0
A2	2	0	0
A3	3	0	0
A4	4	0	0
A5	5	0	0
AC1	2	0.01	0
AC2	2	0.02	0
AC3	2	0.03	0
AC4	2	0.04	0
AC5	2	0.05	0
AS3*	3	0	0
A-NIH*	3	0	1×106

^*Low melting temperature agarose (sieve) was used as the primary hydrogel ink.