Figure 4. Electrical resistivity measurements.
(a) I-V characteristics of the “in-situ” purified FEBID Au nanowire. The inset in (a) shows an SEM image of the used four-point contacts. (b) A measurement series with increasing maximum current from 1.5 mA to 10 mA is shown. The insets in (b) show an AFM image and height profile of the deposited structure.