TABLE II.

PMDS etch rate and selectivity as a function of RF power in CCP system.

Sample	RF power (W)	PDMS etch rate (μm/h)	Selectivity (PDMS/PR etch rate)
1	50	3.5	1.1
2	100	7.7	2.5
3	150	10.3	1.8
4	200	13.6	1.4